PVD technology covers a family of vacuum deposition processes, which include in particular evaporation, sputtering and cathodic arc.
The PVD technology used by Positive Coating is sputtering.
Sputtering is used to coat items made from various materials with a decorative and/or functional colored layer, approximately one micron thick. This type of treatment is used to obtain unalterable colorations while conserving surface finishes and decorations (polished, satin-finished, micro-blasted, Côtes de Genève, circular graining, etc.).
PVD treatment consists in coating the parts in a pre-evacuated sealed chamber. It makes use of the physical principle of bombarding a target with plasma. Atoms emitted from the target are projected onto the parts and the coating is created by stacking effect. The chemically neutral environment of the enclosure allows to obtain highly pure and regular coatings.
In most cases, the deposition temperature is between 50°C and 250°C. Hence this vacuum deposition process works at moderate temperature, in luminescent plasma, in a gas maintained at low pressure.
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