POSITIVE COATING

ALD

ATOMIC LAYER DEPOSITION

ATOMIC LAYER DEPOSITION

It was in 2014 that the company unveiled a new treatment family, known as NanoDeCo® , derived from ALD technology.

ALD (or Atomic Layer Deposition) is a gaseous phase chemical deposition process used to obtain low-stress layers.

PIONEER IN ALD DECORATIVE TREATMENT

As a business, POSITIVE COATING’s pulled off the feat of being able to transpose ALD technology, initially used in the semi-conductors industry for its diffusion barrier properties, by adapting it to the watchmaking sector for its decorative and anticorrosive properties.

ADVANTAGES OF ALD TECHNOLOGY :

  • COMPLIANCE, PERFECT UNIFORMITY
  • CONTROL OF THICKNESS TO A NANOMETRIC SCALE ON COMPLEX GEOMETRIES
  • VARIETIES OF MATERIALS TREATED (copper & titanium alloys, gold, steels and stainless steel, ceramics, plastics, etc.)
  • HIGH DENSITY
  • VERY GOOD CHEMICAL STABILITY
  • EXCELLENT BARRIER LAYER
  • REVERSIBLE PROCESS
  • MULTI-LAYER DEPOSITS OF VARIOUS OXIDES TO COMBINE THE AESTHETIC AND FUNCTIONAL PROPERTIES
  • COMPLEMENTS OTHER TECHNOLOGIES

EXCELLENT HOMOGENEITY ON 3D PARTS

The advantage of this technology lies in the fact that these treatments are perfectly compliant and uniformly deposited, with a precision of around one nanometre. So these layers meet the highest requirements of micro-technology.

ALD SURFACE COATING

OTHER SURFACE COATINGS

NANO-COATING

THE THICKNESS OF OUR COATINGS IS 1000 BILLION TIMES LESS THAN THE ALTITUDE OF LA CHAUX-DE-FONDS

WIDE RANGE OF COLOURS

These treatments stand out for a wide range of colours and shades, perfectly repeatable and applicable to parts with complex 3D geometries.

SURFACE FINISH PRESERVED

Control of the deposited layers to a nanometric scale results in a tiny thickness allowance, in order to conserve the surface mechanical decorations.

ALD treatments are reversible processes, despite the very high chemical stability, and guarantee excellent protection against corrosion of metal substrates.

HOW TO DEPOSIT THIN FILMS OF MATERIAL USING GASEOUS PRECURSORS?

  1. A precursor A is introduced into the chamber, and deposited
    over the entire surface of the treated parts.
  2. A precursor B is then introduced, and reacts with the first atoms deposited, to form a compound. This phenomenon constitutes a cycle.
  3. The cycle is reproduced until you obtain the desired thickness.

The deposition temperature is between 100 and 300 °C.

COATINGS SUITABLE FOR
VARIOUS METALS AND CERAMICS

STAINLESS STEEL

TITANIUM ALLOYS

COPPER ALLOYS

GOLD ALLOYS

HEAVY METAL (TUNGSTEN)

ZIRCONIA

ALUMINA

SAPPHIRE

GLASS

INNOVATION PUSHING BACK THE BOUNDARIES

SOLUTIONS TO SATISFY EVER MORE ADVANCED DESIGNS