POSITIVE COATING

ALD

ATOMIC LAYER DEPOSITION

ATOMIC LAYER DEPOSITION

It was in 2014 that the company unveiled a new treatment family, known as NanoDeCo® , derived from ALD technology.

ALD (or Atomic Layer Deposition) is a gaseous phase chemical deposition process used to obtain low-stress layers.

PIONEER IN ALD DECORATIVE TREATMENT

As a business, POSITIVE COATING has pulled off the feat of transposing ALD technology, initially used in the semi-conductors industry for its diffusion barrier properties, by adapting it to the watchmaking sector for its decorative and anticorrosive properties.

ADVANTAGES OF ALD TECHNOLOGY :

  • COMPLIANCE AND PERFECT UNIFORMITY
  • CONTROL OF  THICKNESS UNIFORMITY AT A NANOMETRIC SCALE
  • VARIETIES OF MATERIALS TREATED (copper & titanium alloys, gold, steels and stainless steel, ceramics, plastics, etc.)
  • HIGH DENSITY
  • VERY GOOD CHEMICAL STABILITY
  • EXCELLENT BARRIER LAYER
  • REVERSIBLE PROCESS
  • MULTI-LAYER COATINGS OF VARIOUS OXIDES TO COMBINE THE AESTHETIC AND FUNCTIONAL PROPERTIES
  • COMPLEMENTS OTHER TECHNOLOGIES

EXCELLENT HOMOGENEITY ON 3D PARTS

The advantage of this technology lies in the fact that these treatments are perfectly compliant and uniformly coated, with a precision of around one nanometre. So these layers meet the highest requirements of micro-technology.

ALD SURFACE COATING

OTHER SURFACE COATINGS

Scale µm

WIDE RANGE OF COLORS

These treatments stand out for a wide range of colors and shades, perfectly repeatable and applicable to parts with complex 3D geometries.

SURFACE FINISH PRESERVED

Control of the coated layers to a nanometric scale results in a tiny thickness allowance, in order to conserve the mechanical decoration surface.

ALD treatments are reversible processes, despite the very high chemical stability, and guarantee excellent protection against corrosion of metal substrates.

HOW TO DEPOSIT THIN FILMS OF MATERIAL USING GASEOUS PRECURSORS?

  1. A precursor A is introduced into the chamber, and deposited
    over the entire surface of the treated parts.
  2. A precursor B is then introduced, and reacts with the first atoms deposited, to form a compound. This phenomenon constitutes a cycle.
  3. The cycle is reproduced until you obtain the desired thickness.

The deposition temperature is between 100 and 300 °C.

COATINGS SUITABLE FOR
VARIOUS METALS AND CERAMICS

STAINLESS STEEL

TITANIUM ALLOYS

COPPER ALLOYS

GOLD ALLOYS

HEAVY METAL (TUNGSTEN)

ZIRCONIA

ALUMINA

SAPPHIRE

GLASS

INNOVATION PUSHING BACK THE BOUNDARIES

SOLUTIONS TO SATISFY EVER MORE ADVANCED DESIGNS