POSITIVE COATING

PVD

PHYSICAL VAPOR DEPOSITION

SPUTTERING

PVD technology covers a family of vacuum deposition processes, which include in particular evaporation, sputtering and cathodic arc. 

The PVD technology used by Positive Coating is sputtering. 

TO MICRON LEVEL

Sputtering is used to coat items made from various materials with a decorative and/or functional colored layer, approximately one micron thick. This type of treatment is used to obtain unalterable colorations while conserving surface finishes and decorations (polished, satin-finished, micro-blasted, Côtes de Genève, circular graining, etc.).

ADVANTAGES OF PVD TECHNOLOGY:

  • EXCELLENT RESULTS IN WATCHMAKING TESTS (climate resistance, UV, etc.)
  • VARIETIES OF MATERIALS TREATED (copper & titanium alloys, gold, steels and stainless steel, ceramics, plastics, etc.)
  • COMPROMISE BETWEEN DUCTILITY AND HARDNESS
  • HOMOGENEITY AND REPEATABILITY OF COLOR AND THICKNESS (from 0.2 to 2 microns)
  • INTRINSIC COLORS (black, shades of grey, brown, blue, etc.) 
  • PROCESS POSSIBLE AT LOW TEMPERATURE
  • RESPECTING FINISHES
  • REVERSIBLE PROCESS

 

MATERIAL AS A SOURCE OF INNOVATION

Vacuum treatments technology entails the use of metals: titanium, chromium, aluminium, gold, platinum… These are what we call the source materials.

 
 

THE SECRETS OF A MATERIAL

Stainless steels, titanium alloys, precious metals, ceramic, etc…, the choice of materials is an essential part of manufacturing an exceptional product. Parts and components should be manufactured in materials selected for guaranteed performance and flawless aesthetics.

For POSITIVE COATING, it is essential to be thoroughly informed of the material to be worked, so that we can suggest and guarantee the right coatings.

PVD COAT

PVD treatment consists in coating the parts in a pre-evacuated sealed chamber. It makes use of the physical principle of bombarding a target with plasma. Atoms emitted from the target are projected onto the parts and the coating is created by stacking effect. The chemically neutral environment of the enclosure allows to obtain highly pure and regular coatings.

HOW TO DEPOSIT VACUUM COATINGS?
  1. After introducing a gas, a plasma is created.
  2. The positively charged ions are accelerated by an electric field
  3. The ions strike the source with sufficient energy to eject atoms
  4. These atoms condense on surfaces placed in proximity, to form the coating

In most cases, the deposition temperature is between 50°C and 250°C. Hence this vacuum deposition process works at moderate temperature, in luminescent plasma, in a gas maintained at low pressure.

COATINGS SUITABLE
FOR VARIOUS METALS AND CERAMICS

STAINLESS STEEL

TITANIUM ALLOYS

COPPER ALLOYS

GOLD ALLOYS

HEAVY METAL (TUNGSTEN)

ZIRCONIA

ALUMINA

SAPPHIRE

GLASS